Ren Xu

Title: Ren Xu: Innovator in Nanoimprint Lithography and Magnetic Media Optimization

Introduction

Ren Xu is a prominent inventor based in San Jose, CA, known for his contributions to the fields of nanoimprint lithography and magnetic media optimization. With a total of 6 patents to his name, Xu has made significant advancements that enhance the efficiency and effectiveness of various manufacturing processes.

Latest Patents

One of Xu's latest patents is titled "Process for optimization of island to trench ratio in patterned media." This invention involves a sequence of process steps that utilize balanced process times in a series of etch chambers. The method optimizes the island to trench ratio for patterned media by employing biased chemical etching with active etching gas to descum and trim resist patterns. Additionally, an inert gas sputter etch is performed on the magnetic layers, resulting in a patterned magnetic layer on the disk. The final step involves stripping to remove residual capping resist and carbon hard mask, allowing for the optimization of the effective magnetic material on the disk surface by adjusting various process conditions.

Another notable patent is the "Method and apparatus for precision surface modification in nano-imprint lithography." This invention features a scalable, high-throughput nanoimprint lithography priming tool that includes a dual-reactant chemical vapor deposition reactor chamber. The design incorporates a mandrel to hold multiple hard disks and a transport mechanism for efficient processing. This innovative tool enhances the capabilities of nanoimprint lithography, making it more effective for industrial applications.

Career Highlights

Ren Xu has worked with several esteemed companies throughout his career, including IBM and Intevac, Inc. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in technology and manufacturing processes.

Collaborations

Throughout his career, Xu has collaborated with notable individuals such as Matthew Joseph Carey and Bruce Alvin Gurney. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Ren Xu's contributions to the fields of nanoimprint lithography and magnetic media optimization demonstrate his innovative spirit and commitment to advancing technology. His patents reflect a deep understanding of complex processes and a drive to improve manufacturing efficiency.