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For the Inventor, By the Inventor

Santa Clara County, CA, United States of America

Kevin P Fairbairn

This inventor holds 69 USPTO granted patents and 6 published patent applications and 5 EPO patents, primarily in Plasma Processing (CPC class H01J). Top assignees: Applied Materials, Inc., Advanced Energy Industries, Inc., Intevac, Inc.. Active years: 1996-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kevin P Fairbairn. Retrieved from https://idiyas.com/inventor/kevin-p-fairbairn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 69 

% Patents Active = 94.2

 

Average Co-Inventor Count = 3.7

ph-index = 35

Forward Citations = 6,997(Granted Patents)

Forward Citations (Not Self Cited) = 6,751(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Saratoga, CA (US) (1996 - 2010)
  • Santa Clara County, CA (US) (2005 - 2011)
  • Los Gatos, CA (US) (2002 - 2023)

Company Filing History:

goldMedal39 out of 14,482 
 
Applied Materials, Inc.
 patents
silverMedal16 out of 365 
 
Advanced Energy Industries, Inc.
 patents
bronzeMedal10 out of 121 
 
Intevac, Inc.
 patents
4. 3 out of 478 
 
Brooks Automation Gmbh
 patents
5. 1 out of 834,570 
Other
 patents

Years Active: 1996-2026

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Areas of Expertise:
Plasma Processing
Bias Supplies
Spatial Control
Excitation Source
Substrate Transport
High Throughput
Solar Cell Fabrication
Inductive Coupling
Metrology
Amorphous Carbon Layer
Load Lock
Doped Layer
69 patents (USPTO):Explore Patents
1. 12700569 - Control of plasma sheath with bias supplies (2026-08-04),
2. 12505986 - Synchronization of plasma processing components (2025-12-23),
3. 12176184 - Synchronization of bias supplies (2024-12-24),
4. 12159767 - Spatial control of plasma processing environments (2024-12-03),
5. 12142460 - Control of plasma sheath with bias supplies (2024-11-12),
6. 11842884 - Spatial monitoring and control of plasma processing environments (2023-12-12),
7. 11610761 - Synchronization between an excitation source and a substrate bias supply (2023-03-21),
8. 11437221 - Spatial monitoring and control of plasma processing environments (2022-09-06),
9. 11282677 - Spatial monitoring and control of plasma processing environments (2022-03-22),
10. 11264209 - Application of modulating supplies in a plasma processing system (2022-03-01),
11. 10896807 - Synchronization between an excitation source and a substrate bias supply (2021-01-19),
12. 10811229 - Synchronization with a bias supply in a plasma processing system (2020-10-20),
13. 10811228 - Control of plasma processing systems that include plasma modulating supplies (2020-10-20),
14. 10811227 - Application of modulating supplies in a plasma processing system (2020-10-20),
15. 10752987 - System architecture for combined static and pass-by processing (2020-08-25),

Title: The Innovative Journey of Kevin P Fairbairn

Introduction: Kevin P Fairbairn is a pioneering inventor based in Santa Clara County, CA (US) known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Kevin P Fairbairn holds several patents in the areas of artificial intelligence, machine learning, and robotics, showcasing his commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Kevin P Fairbairn has worked with leading tech companies in Silicon Valley, where he has played a key role in developing cutting-edge technologies that have revolutionized various industries.

Collaborations: Throughout his career, Kevin P Fairbairn has collaborated with top researchers, engineers, and scientists, both nationally and internationally, to bring innovative ideas to life and create solutions that have a lasting impact.

Conclusion: Kevin P Fairbairn's passion for innovation and his relentless drive to create technologies that shape the future make him a true visionary in the world of inventions. His work continues to inspire the next generation of inventors and innovators worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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