The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2020

Filed:

Feb. 19, 2018
Applicant:

Intevac, Inc., Santa Clara, CA (US);

Inventors:

Patrick Leahey, San Jose, CA (US);

Eric Lawson, Sunnyvale, CA (US);

Charles Liu, Los Altos, CA (US);

Terry Bluck, Santa Clara, CA (US);

Kevin P. Fairbairn, Los Gatos, CA (US);

Robert L. Ruck, San Jose, CA (US);

Samuel D. Harkness, IV, Berkeley, CA (US);

Assignee:

INTEVAC, INC., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/50 (2006.01); C23C 14/56 (2006.01); H01J 37/32 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/34 (2013.01); C23C 14/50 (2013.01); C23C 14/566 (2013.01); C23C 14/568 (2013.01); H01J 37/32889 (2013.01); H01J 37/32899 (2013.01); H01J 37/3488 (2013.01);
Abstract

Disclosed is a substrate processing system which enables combined static and pass-by processing. Also, a system architecture is provided, which reduces footprint size. The system is constructed such that the substrates are processed therein vertically, and each chamber has a processing source attached to one sidewall thereof, wherein the other sidewall backs to a complementary processing chamber. The chamber system can be milled from a single block of metal, e.g., aluminum, wherein the block is milled from both sides, such that a wall remains and separates each two complementary processing chambers.


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