This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Asml Netherlands B.v.. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013
Title: Innovator Spotlight: Ralf Martinus Marinus Daverveld
Introduction: Meet Ralf Martinus Marinus Daverveld, a talented inventor based in EL Sint-Oedenrode, NL, known for his groundbreaking work in the field of substrate inspection and lithography preparation.
Latest Patents: Ralf Martinus Marinus Daverveld holds 1 patent titled "Method of inspecting a substrate and method of preparing a substrate for lithography." This patent discloses a method that involves directing electromagnetic radiation at an acute angle towards the edge of layers on a substrate, detecting scattered or reflected radiation, and determining if edges of different layers overlap.
Career Highlights: Ralf Martinus Marinus Daverveld is affiliated with ASML Netherlands B.V., a prominent company in the industry. His innovative contributions have paved the way for advancements in substrate inspection technologies, benefiting the field of lithography.
Collaborations: Ralf Martinus Marinus Daverveld has collaborated with notable colleagues such as Rik Vangheluwe and Youri Johannes Laurentius Maria Van Dommelen. Their combined expertise has led to the development of cutting-edge solutions that have been well-received in the industry.
Conclusion: In conclusion, Ralf Martinus Marinus Daverveld's inventive spirit and dedication to excellence have positioned him as a key figure in the realm of substrate inspection and lithography preparation. His contributions continue to drive innovation and shape the future of technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile