The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2013
Filed:
May. 22, 2007
Rik Teodoor Vangheluwe, Bergeijk, NL;
Youri Johannes Laurentius Maria Van Dommelen, Ballston Lake, NY (US);
Johannes Anna Quaedackers, Veldhoven, NL;
Cédric Désiré Grouwstra, Eindhoven, NL;
Thijs Egidius Johannes Knaapen, HD Beek en Donk, NL;
Ralf Martinus Marinus Daverveld, EL Sint-Oedenrode, NL;
Jeroen Hubert Rommers, Lommel, BE;
Rik Teodoor Vangheluwe, Bergeijk, NL;
Youri Johannes Laurentius Maria Van Dommelen, Ballston Lake, NY (US);
Johannes Anna Quaedackers, Veldhoven, NL;
Cédric Désiré Grouwstra, Eindhoven, NL;
Thijs Egidius Johannes Knaapen, HD Beek en Donk, NL;
Ralf Martinus Marinus Daverveld, EL Sint-Oedenrode, NL;
Jeroen Hubert Rommers, Lommel, BE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of inspecting a substrate with first and second layers thereon is disclosed. The method includes directing a beam of electromagnetic radiation at an acute angle towards an edge of the layers, detecting scattered and/or reflected electromagnetic radiation, and establishing, from results of the detecting, whether an edge of the second layer overlaps an edge of the first layer.