Company Filing History:
2 out of 181 
1 out of 832,680 Years Active: 2002-2009
Title: Ralf M Hartmann: Innovator in Thin-Film Deposition Technologies
Introduction
Ralf M Hartmann is a notable inventor based in Richfield, MN (US). He has made significant contributions to the field of thin-film deposition technologies, holding a total of 3 patents. His work focuses on innovative methods and devices that enhance the efficiency and effectiveness of material deposition processes.
Latest Patents
One of Hartmann's latest patents is for a thin-film deposition evaporator. This invention features a material source evaporator designed for use within an evacuable interior deposition chamber. The evaporator allows for the deposition of evaporated materials onto substrates. It includes a container with an associated heater that can heat vaporizable material, producing vapor that is distributed through a manifold with output apertures. This design ensures a calibrated spatial distribution of material vapor, resulting in a uniformly thick layer on the substrate.
Another significant patent by Hartmann describes a method of surface treating or coating materials. This method involves treating or coating at least a portion of the surface of selected materials, including metallic and polymeric substances. The process utilizes atmospheric plasma generated by an indirect plasmatron, which can lead to various surface modifications such as increased surface tension, surface grafting, cleaning, and sterilization.
Career Highlights
Throughout his career, Ralf M Hartmann has worked with various companies, including Wolff Walsrode AG. His experience in the industry has allowed him to develop and refine his innovative approaches to material deposition and surface treatment.
Collaborations
Hartmann has collaborated with notable professionals in his field, including Christian Kuckertz and Sven Jacobsen. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Ralf M Hartmann is a distinguished inventor whose work in thin-film deposition technologies has led to significant advancements in the field. His innovative patents and collaborations reflect his commitment to enhancing material processing techniques.
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