The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2002
Filed:
Mar. 06, 2001
Christian Kuckertz, Fallingbostel, DE;
Sven Jacobsen, Fallingbostel, DE;
Rainer Brandt, Walsrode, DE;
Klaus Landes, München, DE;
Ralf Hartmann, Richfield, MN (US);
Wolff Walsrode AG, Walsrode, DE;
Abstract
Described is a process for the homogeneous surface activation of a material in web form, by means of plasma-treatment. The material in web form is selected from metallic materials in web form having a thickness of less than 100 &mgr;m, polymeric materials in web form and combinations thereof. The process involves treating homogeneously at least a portion of the surface of the material in web form, which is moved over at least one pair of rolls, with an atmospheric plasma, optionally in the presence of a process gas and/or a process aerosol. The atmospheric plasma is generated by an indirect plasmatron.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile