Ralf B Willecke

Title: Innovations by Ralf B Willecke in Plasma Processes

Introduction

Ralf B Willecke is a prominent inventor based in Santa Clara, CA (US). He has made significant contributions to the field of plasma processes, particularly in the deposition of low dielectric constant films. With a total of 14 patents to his name, Willecke's work has had a substantial impact on the semiconductor industry.

Latest Patents

One of Willecke's latest patents focuses on plasma processes for depositing low dielectric constant films. This method and apparatus involve the reaction of an organosilicon compound with an oxidizing gas at a constant RF power level. The innovation allows for increased dissociation of the oxidizing gas prior to mixing, which helps control the carbon content of the deposited film. The resulting oxidized organosilane or organosiloxane film exhibits excellent barrier properties, making it suitable for use as a liner or cap layer adjacent to other dielectric layers. Additionally, this film can serve as an etch stop and an intermetal dielectric layer for fabricating dual damascene structures, providing superior adhesion between different dielectric layers.

Another notable patent by Willecke describes a method of depositing low k films. In this process, a silicon oxide layer is produced through plasma-enhanced decomposition of an organosilicon compound, resulting in films with a carbon content of at least 1% by atomic weight. The introduction of an optional carrier gas facilitates the deposition process, while temporarily increasing oxidation of the organosilicon compound can create an oxygen-rich surface adjacent to the silicon oxide layer.

Career Highlights

Willecke is currently employed at Applied Materials, Inc., where he continues to innovate in the field of semiconductor manufacturing. His work has been instrumental in advancing technologies that enhance the performance and efficiency of electronic devices.

Collaborations

Throughout his career, Willecke has collaborated with notable colleagues, including David Wingto Cheung and Wai-Fan Yau. These partnerships have contributed to the development of cutting-edge technologies in the industry.

Conclusion

Ralf B Willecke's contributions to plasma processes and low dielectric constant films have established him as a key figure in semiconductor innovation. His patents reflect a commitment to advancing technology and improving manufacturing processes in the electronics sector.