Santa Clara, CA, United States of America

Rajaram Narayanan

USPTO Granted Patents = 4 

Average Co-Inventor Count = 6.3

ph-index = 1


Company Filing History:


Years Active: 2023-2025

where 'Filed Patents' based on already Granted Patents

4 patents (USPTO):

Title: Rajaram Narayanan: Innovator in Semiconductor Processing Technologies

Introduction

Rajaram Narayanan, a distinguished inventor based in Santa Clara, CA, has made significant contributions to the field of semiconductor processing. With a total of four patents to his name, Narayanan's work primarily focuses on methods that enhance the stability and efficiency of carbon film technologies. His innovative approaches are paving the way for advancements in various applications within the semiconductor industry.

Latest Patents

Narayanan's latest patents highlight his expertise in creating advanced processing methods. One of his notable inventions is the "Methods of forming thermally stable carbon film," which outlines a novel approach for processing substrates. This method involves flowing a deposition gas comprising a hydrocarbon compound and a dopant compound into a controlled process volume. By generating plasma at the substrate, the patented method allows for the deposition of a doped diamond-like carbon film, which is then annealed to achieve improved mechanical properties.

Another significant patent is the "Gas mixer to enable RPS purging," which outlines a semiconductor processing system featuring a remote plasma source (RPS). This invention includes a sophisticated arrangement of purge and deposition outlets that enhances the efficiency of the semiconductor manufacturing process.

Career Highlights

Rajaram Narayanan is a key contributor at Applied Materials, Inc. His role at this renowned company allows him to engage in cutting-edge research and development, focusing on the complexities of semiconductor technology. His innovative spirit and expertise in the field have made him a valuable asset to his team.

Collaborations

Narayanan works alongside talented colleagues, including Fang Ruan and Diwakar N Kedlaya. Together, they collaborate to push the boundaries of semiconductor innovations, combining their unique skills and insights to drive the industry's technological advancements.

Conclusion

Rajaram Narayanan exemplifies the spirit of innovation and excellence in semiconductor processing technologies. His patents reflect a deep understanding of the complexities involved in the industry and demonstrate his commitment to advancing technology. With his continued contributions at Applied Materials, Inc., Narayanan is undoubtedly a key figure to watch in the realm of semiconductor innovations.

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