Raimund Sindlinger

Title: Raimund Sindlinger: Innovator in Photoresist Technology

Introduction

Raimund Sindlinger is a notable inventor based in Ober-Ramstadt, Germany. He has made significant contributions to the field of photoresist technology, holding 2 patents that showcase his innovative approaches.

Latest Patents

Sindlinger's latest patents include a process for the production of photoresist relief structures. This process involves coating a substrate with a positive-working photoresist composition based on phenol/formaldehyde condensates of the novolak resin type and photosensitive o-quinonediazide compounds. The method includes imagewise overexposure of the photoresist layer at an energy exceeding that required to produce relief structures with a 90-degree angle between the photoresist compound and the substrate. Additionally, he developed a buffered, aqueous, alkaline developer containing 1-100 ppm of an oxyethylated alkylphenol as a non-ionic surfactant. His second patent focuses on a developer suitable for use with positive photoresists, which is based on a buffered aqueous-alkaline solution containing non-ionic surfactants. This developer shows outstanding properties regarding resolution, edge sharpness, developing activity, capacity, and stability.

Career Highlights

Sindlinger is associated with Merck Patent Gesellschaft mit beschränkter Haftung, where he continues to advance the field of photoresist technology. His work has been instrumental in enhancing the performance of photoresists used in various applications.

Collaborations

Throughout his career, Sindlinger has collaborated with notable colleagues, including Winfried Baron and Kurt Marquard. These collaborations have contributed to the development of innovative solutions in the field.

Conclusion

Raimund Sindlinger is a distinguished inventor whose work in photoresist technology has led to significant advancements. His patents reflect his commitment to innovation and excellence in the field.