The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 1987
Filed:
Jul. 26, 1985
Klaus P Thiel, Brensbach-Wersau, DE;
Raimund Sindlinger, Ober-Ramstadt, DE;
Hans J Merrem, Seeheim, DE;
Merck Patent Gesellschaft mit beschrankter Haftung, Darmstadt, DE;
Abstract
A process for the production of photoresist relief structures possessing an overhang character comprising coating a substrate with a positive-working photoresist composition based on phenol/formaldehyde condensates of the novolak resin type and photosensitive o-quinonediazide compounds, imagewise overexposure of the photoresist layer at an energy exceeding that required to produce relief structures with a 90.degree. angle between the photoresist compound and the substrate, and treatment of the overexposed layer and substrate with a buffered, aqueous, alkaline developer containing 1-100 ppm of an oxyethylated alkylphenol as a non-ionic surfactant.