This inventor holds 5 USPTO granted patents. Top assignees: Merck Patent Gesellschaft MIT Beschrankter Haftung, Ciba-Geigy Corporation. Active years: 1987-1995.
Company Filing History:
3 out of 1,248 
2 out of 6,858 Years Active: 1987-1995
Title: The Innovations of Hans J Merrem
Introduction
Hans J Merrem is a notable inventor based in Seeheim, Germany. He has made significant contributions to the field of photopatterning and photoresist compositions. With a total of 5 patents, his work has had a considerable impact on the industry.
Latest Patents
Merrem's latest patents focus on the process of photopatterning a substrate with a positive photoresist. One of his key innovations involves the addition of compounds of a specific formula to positive photoresist compositions based on a diazoquinone/novolak resin. This addition effectively suppresses stray radiation and halation effects in corresponding photoresist coatings, particularly when applied to highly reflective substrates. His work in positive diazo quinone photoresist compositions has been instrumental in enhancing the performance of these materials.
Career Highlights
Throughout his career, Hans J Merrem has worked with prominent companies such as Merck Patent Gesellschaft mit beschränkter Haftung and Ciba-Geigy Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in the field of photopatterning.
Collaborations
Merrem has collaborated with notable colleagues, including Rudolf Klug and Thomas Herold. These partnerships have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Hans J Merrem's contributions to the field of photopatterning and photoresist compositions demonstrate his innovative spirit and dedication to advancing technology. His patents continue to influence the industry and pave the way for future developments.