Klaus P Thiel

Title: Klaus P Thiel: Innovator in Photoresist Technology

Introduction

Klaus P Thiel is a notable inventor based in Brensbach-Wersau, Germany. He has made significant contributions to the field of photoresist technology, particularly in the production of relief structures. His innovative approach has led to the development of a unique process that enhances the capabilities of photoresist materials.

Latest Patents

Klaus P Thiel holds a patent for a process aimed at the production of photoresist relief structures. This process involves coating a substrate with a positive-working photoresist composition based on phenol/formaldehyde condensates of the novolak resin type and photosensitive o-quinonediazide compounds. The method includes imagewise overexposure of the photoresist layer at an energy exceeding that required to produce relief structures with a 90-degree angle between the photoresist compound and the substrate. Furthermore, the overexposed layer and substrate are treated with a buffered, aqueous, alkaline developer containing 1-100 ppm of an oxyethylated alkylphenol as a non-ionic surfactant. This innovative process has the potential to improve the efficiency and effectiveness of photoresist applications.

Career Highlights

Klaus P Thiel is associated with Merck Patent Gesellschaft mit beschränkter Haftung, where he continues to contribute to advancements in his field. His work has been instrumental in pushing the boundaries of photoresist technology, making him a valuable asset to his organization.

Collaborations

Throughout his career, Klaus has collaborated with notable colleagues, including Raimund Sindlinger and Hans J Merrem. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Klaus P Thiel's contributions to photoresist technology exemplify the spirit of innovation in the field of materials science. His patented process for producing relief structures showcases his expertise and commitment to advancing technology. His work continues to influence the industry and inspire future developments.