The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 1986
Filed:
Dec. 21, 1984
Applicant:
Inventors:
Winfried Baron, Rossdorf, DE;
Kurt Marquard, Reinheim, DE;
Hans-Joachim Merrem, Seeheim, DE;
Raimund Sindlinger, Ober-Ramstadt, DE;
Klaus-Peter Thiel, Brensbach-Wersau, DE;
Assignee:
Merck Patent Gesellschaft mit beschrankter Haftung, Darmstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03F / ;
U.S. Cl.
CPC ...
430331 ; 430309 ;
Abstract
A developer suitable for use with positive photoresists is based on a buffered aqueous-alkaline solution containing non-ionic surfactants and contains in the solution 1-100 ppm of the surfactants, preferably of the ethoxylated-alkylphenol type. The resultant photoresist shows outstanding properties with respect to the resolution and edge sharpness obtainable in the developed resist image and with respect to its developing activity, developing capacity and stability.