Klaus-Peter Thiel

Title: Klaus-Peter Thiel: Innovator in Photoresist Development

Introduction

Klaus-Peter Thiel is a notable inventor based in Brensbach-Wersau, Germany. He has made significant contributions to the field of photoresist technology, particularly in the development of a developer suitable for use with positive photoresists. His innovative work has led to advancements in the resolution and edge sharpness of developed resist images.

Latest Patents

Klaus-Peter Thiel holds 1 patent for his invention titled "Developer for Positive Photoresists." This patent describes a developer based on a buffered aqueous-alkaline solution containing non-ionic surfactants. The solution includes 1-100 ppm of surfactants, preferably of the ethoxylated-alkylphenol type. The resultant photoresist demonstrates outstanding properties regarding resolution, edge sharpness, developing activity, developing capacity, and stability.

Career Highlights

Thiel is associated with Merck Patent Gesellschaft mit beschränkter Haftung, where he has been instrumental in advancing photoresist technology. His work has been recognized for its impact on the semiconductor industry, particularly in enhancing the performance of photoresists used in lithography.

Collaborations

Throughout his career, Klaus-Peter Thiel has collaborated with notable colleagues, including Winfried Baron and Kurt Marquard. These collaborations have contributed to the development of innovative solutions in the field of photoresists.

Conclusion

Klaus-Peter Thiel's contributions to photoresist development have established him as a key figure in the field. His innovative approach and collaboration with other experts have led to significant advancements in technology.