This inventor holds 1 USPTO granted patent. Top assignee: Merck Patent Gesellschaft MIT Beschrankter Haftung. Active years: 1986.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1986
Title: Winfried Baron: Innovator in Photoresist Development
Introduction
Winfried Baron is a notable inventor based in Rossdorf, Germany. He has made significant contributions to the field of photoresist technology, particularly through his innovative patent related to developers for positive photoresists.
Latest Patents
Winfried Baron holds a patent for a developer suitable for use with positive photoresists. This developer is based on a buffered aqueous-alkaline solution containing non-ionic surfactants. The solution includes 1-100 ppm of the surfactants, preferably of the ethoxylated-alkylphenol type. The resultant photoresist demonstrates outstanding properties regarding resolution and edge sharpness in the developed resist image, as well as its developing activity, capacity, and stability.
Career Highlights
Winfried Baron is associated with Merck Patent Gesellschaft mit beschränkter Haftung, where he has been able to apply his expertise in photoresist development. His work has contributed to advancements in the field, enhancing the quality and performance of photoresist materials.
Collaborations
Throughout his career, Winfried Baron has collaborated with notable colleagues, including Kurt Marquard and Hans-Joachim Merrem. These collaborations have further enriched his work and contributed to the success of his innovations.
Conclusion
Winfried Baron is a distinguished inventor whose work in photoresist development has made a significant impact in the field. His innovative solutions continue to influence the industry and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile