Company Filing History:
Years Active: 2001-2002
Title: Raijiro Koga: Innovator in Polishing Technology
Introduction
Raijiro Koga is a notable inventor based in Tsuchiura, Japan. He has made significant contributions to the field of polishing technology, particularly in the development of conditioning disks and cleaning apparatuses for polishing pads. With a total of 3 patents to his name, Koga continues to push the boundaries of innovation in his field.
Latest Patents
Koga's latest patents include a conditioning disk designed for conditioning a polishing pad. This invention provides an apparatus and method for conditioning a polishing pad in a polishing system. One embodiment features a conditioning disk with conditioning elements positioned on the bottom surface, away from the center portion of the disk. Another embodiment includes a base plate and a ring-shaped plate where the conditioning elements are located. Additionally, Koga has developed a pad conditioner cleaning apparatus that consists of a conditioner head, a cleaning cup for receiving and cleaning the conditioner head, and a fluid dispenser for applying a cleaning fluid onto the conditioner head.
Career Highlights
Raijiro Koga is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work focuses on enhancing the efficiency and effectiveness of polishing processes, which are critical in the manufacturing of various electronic components.
Collaborations
Koga has collaborated with several talented individuals in his field, including Hiromi Tsuruta and Takashi Kumagai. These collaborations have contributed to the advancement of polishing technologies and have fostered a spirit of innovation within their team.
Conclusion
Raijiro Koga is a prominent inventor whose work in polishing technology has led to significant advancements in the industry. His innovative patents and collaborations reflect his commitment to improving manufacturing processes.