The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2002
Filed:
Dec. 29, 1998
Applicant:
Inventors:
Raijiro Koga, Tsuchiura, JP;
Hiromi Tsuruta, Sakura, JP;
Takashi Kumagai, Yokohama, JP;
Gee Hoey, San Jose, CA (US);
Brian J. Brown, Palo Alto, CA (US);
Boris Fishkin, San Carlos, CA (US);
Fred C. Redeker, Fremont, CA (US);
Bruce Lu, Hsin-Chu, TW;
Rex Lu, Hsin-Chu, TW;
K. Y. Wang, Hsin-Chu, TW;
Roland Shu, Hsin-Chu, TW;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 ;
U.S. Cl.
CPC ...
B24B 1/00 ;
Abstract
A chemical mechanical polishing apparatus includes a pad conditioner having a conditioner head, a cleaning cup for receiving and cleaning the conditioner head of the pad conditioner, and a fluid dispenser for dispensing a cleaning fluid onto the conditioner head.