This inventor holds 2 USPTO granted patents and 6 published patent applications. Top assignee: Asml Netherlands B.v.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Raaja Ganapathy Subramanian: Innovator in Lithographic Technology
Introduction
Raaja Ganapathy Subramanian is a notable inventor based in Maarheeze, Netherlands. He has made significant contributions to the field of lithography, particularly in the thermal conditioning of reticles. With a total of 2 patents, his work focuses on enhancing the efficiency and accuracy of lithographic processes.
Latest Patents
One of his latest patents is titled "Methods and systems to calibrate reticle thermal effects." This innovative method aims to reduce the effects of heating and cooling on a reticle during lithographic processes. It involves conditioning the reticle to achieve a predetermined temperature, reducing stress to minimize parasitic thermal effects, and calibrating a reticle heating model. This method enhances calibration accuracy and speed, reduces conditioning times, and ultimately increases throughput and yield.
Another significant patent is "Systems, methods, and devices for thermal conditioning of reticles in lithographic apparatuses." This patent describes a cooling system designed to thermally condition patterning devices within lithographic apparatuses. The system includes a thermal conditioner and a controller that manages the temperature state of the patterning device, ensuring optimal performance during exposures.
Career Highlights
Raaja Ganapathy Subramanian is currently employed at ASML Netherlands B.V., a leading company in the development of lithographic systems for the semiconductor industry. His expertise in thermal conditioning and calibration has positioned him as a key player in advancing lithographic technology.
Collaborations
He collaborates with Jean-Philippe Xavier Van Damme, contributing to the innovative projects at ASML. Their combined efforts focus on improving the efficiency and effectiveness of lithographic processes.
Conclusion
Raaja Ganapathy Subramanian's contributions to lithographic technology through his patents and work at ASML highlight his role as an influential inventor in the field. His innovative methods and systems continue to enhance the capabilities of lithographic processes, paving the way for advancements in semiconductor manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile