The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
Oct. 12, 2022
Asml Netherlands B.v., Veldhoven, NL;
Raaja Ganapathy Subramanian, Maarheeze, NL;
Bearrach Moest, Eindhoven, NL;
Alexander Alexandrovich Danilin, Eindhoven, NL;
Rowin Meijerink, Valkenswaard, NL;
Tim Izaak Johannes Goossen, Waalre, NL;
Stanislav Markovich Shumiacher, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of reducing effects of heating and/or cooling a reticle in a lithographic process includes conditioning the reticle to adjust an initial temperature of the reticle to a predetermined temperature, reducing stress in the reticle to reduce parasitic thermal effects, calibrating a reticle heating model by exposing the reticle and a non-production substrate to a dose of radiation, and processing a production substrate by exposing the reticle and a production substrate to a dose of radiation based on the reticle heating model. The method can increase calibration accuracy and speed of the reticle heating model, reduce conditioning times of the reticle, reduce stress in the reticle, avoid rework of production substrates, and increase throughput, yield, and accuracy.