Quan Li

Title: Innovations by Inventor Quan Li

Introduction

Quan Li is a notable inventor based in Xi'an, China. He has made significant contributions to the field of optoelectronics, particularly in the development of advanced measurement techniques. With a total of 2 patents to his name, his work focuses on enhancing measurement precision and efficiency.

Latest Patents

One of Quan Li's latest patents is a "Generation method for programmable analog fringe pattern with extended depth of field." This invention provides a method for generating a programmable analog fringe pattern using a laser beam. The process involves focusing and collimating the laser beam, which is then reflected by a mirror and passed through a diaphragm before being directed onto a MEMS scanning mirror. The scanning mirror facilitates the generation of a fringe pattern image by modulating the brightness of the laser beam.

Another significant patent is the "Hybrid light measurement method for measuring three-dimensional profile." This method utilizes a MEMS laser projector to project a laser stripe and fringe pattern. It incorporates binocular stereo vision for reconstruction, allowing for quick measurement of three-dimensional profiles of objects with varying surface properties. This innovative approach enables both laser stripe and fringe pattern measurements to be conducted using the same system, enhancing measurement precision and speed.

Career Highlights

Quan Li is currently employed at Xi'an Chishine Optoelectronics Technology Co., Ltd. His work at this company has been instrumental in advancing optoelectronic technologies. He has demonstrated a strong commitment to innovation and research in his field.

Collaborations

Quan Li has collaborated with notable colleagues, including Xiang Zhou and Tao Yang. These partnerships have contributed to the development of his innovative measurement techniques and have fostered a collaborative environment for research and development.

Conclusion

In summary, Quan Li is a distinguished inventor whose work in optoelectronics has led to significant advancements in measurement technologies. His patents reflect a commitment to innovation and precision in the field.