The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2022
Filed:
Jan. 29, 2020
Xi 'an Chishine Optoelectronics Technology Co., Ltd., Xi'an, CN;
Xiang Zhou, Xi'an, CN;
Tao Yang, Xi'an, CN;
Rui Jin, Xi'an, CN;
Quan Li, Xi'an, CN;
Tao Liu, Xi'an, CN;
Li Ma, Xi'an, CN;
Junqi Huang, Xi'an, CN;
Huanhuan Li, Xi'an, CN;
Abstract
Provided is a generation method for a programmable analog fringe pattern with an extended depth of field. A laser emits a laser beam. After focusing and collimation thereof with a collimating lens, a collimated Gaussian laser beam meeting requirements is obtained. The laser beam is reflected by a mirror once, passes through a round diaphragm and is incident on a MEMS scanning mirror. The beam is reflected by the MEMS scanning mirror to the surface of a tested object. The laser is controlled by a sinusoidal current signal generated by a drive board so as to sinusoidally modulate the brightness of the laser beam. The MEMS scanning mirror is stimulated by a drive signal generated by the drive board to turn two-dimensionally, so as to drive the laser beam to perform scanning, thus generating a fringe pattern image.