Qinglin Li

Title: Innovations of Qinglin Li in Patterning Processes

Introduction

Qinglin Li is a notable inventor based in San Jose, CA, who has made significant contributions to the field of patterning processes. His innovative work focuses on optimizing aspects of these processes to enhance performance and reduce defects. With a single patent to his name, Li's expertise is recognized in the industry.

Latest Patents

Qinglin Li holds a patent titled "Method of determining characteristic of patterning process based on defect for reducing hotspot." This patent outlines methods for optimizing a patterning process based on defects. The method involves obtaining a location on a substrate with a threshold probability of having a defect, defining a defect ambit around that location, and determining cost functions and guide functions to adjust source and mask characteristics accordingly.

Career Highlights

Li is currently employed at ASML Netherlands B.V., a leading company in the semiconductor industry. His work at ASML involves applying his innovative methods to improve the efficiency and effectiveness of patterning processes used in semiconductor manufacturing.

Collaborations

Some of Qinglin Li's coworkers include Xingyue Peng and Duan-Fu Stephen Hsu, who collaborate with him on various projects within the company.

Conclusion

Qinglin Li's contributions to the field of patterning processes demonstrate his commitment to innovation and excellence. His patent reflects a deep understanding of the complexities involved in semiconductor manufacturing, positioning him as a valuable asset in the industry.