Company Filing History:
Years Active: 2017-2024
Title: Qinggang Xing: Innovator in Oxide Semiconductor Technology
Introduction
Qinggang Xing is a prominent inventor based in Singapore, known for his contributions to the field of semiconductor technology. He holds a total of 5 patents, showcasing his innovative spirit and technical expertise. His work primarily focuses on oxide semiconductor field effect transistors, which are crucial for modern electronic devices.
Latest Patents
One of Qinggang Xing's latest patents involves an oxide semiconductor field effect transistor (OSFET). This invention includes a first insulating layer, a source, a drain, a U-shaped channel layer, and a metal gate. The first insulating layer is disposed on a substrate, while the source and drain are integrated within this layer. The U-shaped channel layer is sandwiched between the source and drain, and the metal gate is positioned on top of the U-shaped channel layer, which contains at least one oxide semiconductor layer. This patent also outlines a method for forming the oxide semiconductor field effect transistor, highlighting its innovative design and functionality.
Career Highlights
Qinggang Xing is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His role at the company allows him to further develop his ideas and contribute to cutting-edge technology in the field. His work has significantly impacted the advancement of semiconductor devices, making them more efficient and reliable.
Collaborations
Throughout his career, Qinggang has collaborated with notable colleagues, including Chien-Ming Lai and Yen-Chen Chen. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Qinggang Xing's contributions to oxide semiconductor technology exemplify his dedication to innovation in the field. His patents and collaborations reflect a commitment to advancing semiconductor technology, making him a key figure in the industry.