Qiang Wu

Title: Qiang Wu: Innovator in Tip-to-Tip Graphic Preparation Method

Introduction

Qiang Wu is a notable inventor based in Shanghai, China. He has made significant contributions to the field of graphic preparation methods, particularly with his innovative Tip-to-Tip pattern preparation technique. His work has implications for various applications in the semiconductor industry.

Latest Patents

Qiang Wu holds a patent for a method titled "Tip-to-Tip Graphic Preparation Method." This invention discloses a process that involves providing a substrate and sequentially forming several layers, including a layer to be etched, hard mask layers, a sacrificial layer, a dielectric layer, and a photoresist layer. The method utilizes EUV lithography to create a first and second Tip-to-Tip pattern, which are then transferred to the hard mask layer through etching. This innovative approach allows for the formation of small-sized Tip-to-Tip patterns with a halved period, significantly reducing the number of lithography layers required.

Career Highlights

Throughout his career, Qiang Wu has worked with prominent companies, including Shanghai IC R&D Center Co., Ltd and SAIC Motor Corporation Limited. His experience in these organizations has contributed to his expertise in the field of graphic preparation methods.

Collaborations

Qiang Wu has collaborated with talented individuals such as Yanli Li and Yushu Yang. Their combined efforts have further advanced the research and development of innovative technologies in their respective fields.

Conclusion

Qiang Wu's contributions to the field of graphic preparation methods, particularly through his Tip-to-Tip pattern preparation technique, highlight his innovative spirit and dedication to advancing technology. His work continues to influence the semiconductor industry and inspire future innovations.