Company Filing History:
Years Active: 2016-2017
Title: Prativa Pandey: Innovator in Chemical-Mechanical Polishing Technologies
Introduction
Prativa Pandey is a notable inventor based in Aurora, IL (US). She has made significant contributions to the field of chemical-mechanical polishing, with a focus on improving the stability and characteristics of polishing compositions. With a total of 2 patents, her work has advanced the technology used in semiconductor manufacturing.
Latest Patents
Prativa's latest patents include innovative formulations that enhance the performance of polishing compositions. One of her inventions is a selective nitride slurry that provides improved stability and polishing characteristics. This composition consists of wet-process ceria, a cationic polymer with quaternary amino groups, a non-fluorinated nonionic surfactant, an amino acid, and water, with a pH range of about 3 to 8. Additionally, she has developed CMP compositions that exhibit reduced dishing in STI wafer polishing, utilizing a ceria abrasive and an ionic polymer.
Career Highlights
Throughout her career, Prativa has worked with prominent companies in the industry, including Cabot Microelectronics Corporation and CMC Materials, Inc. Her expertise in chemical-mechanical polishing has positioned her as a key player in the development of advanced polishing technologies.
Collaborations
Prativa has collaborated with talented individuals in her field, including Juyeon Chang and Brian Reiss. These partnerships have contributed to her innovative work and the successful development of her patents.
Conclusion
Prativa Pandey's contributions to the field of chemical-mechanical polishing demonstrate her commitment to innovation and excellence. Her patents reflect her expertise and the impact of her work on the semiconductor industry.