Prasad N Gadgil

Title: Innovations of Prasad N Gadgil

Introduction

Prasad N Gadgil is a notable inventor based in Santa Clara, CA, with a remarkable portfolio of seven patents. His work primarily focuses on advancements in atomic layer deposition (ALD) and chemical vapor deposition (CVD) processes, which are crucial in various technological applications.

Latest Patents

One of his latest patents is a particle reactor designed for ALD and CVD processes. This innovative powder coating apparatus reactor features a loading port for powder material, an inlet for coating precursors, and a reaction chamber equipped with axial baffles. These baffles ensure that the powder material flows effectively within the chamber during the rotary vessel's rotation, enhancing the interaction between the powder and the precursors. Additionally, the apparatus includes a rotary vacuum seal and a motor for optimal operation during the reaction process. Another significant patent involves a method for filling recessed structures in semiconductor devices. This process utilizes high-speed atomic layer chemical vapor processing to deposit diffusion barriers and perform gap fills, streamlining the metallization process and improving efficiency.

Career Highlights

Throughout his career, Prasad N Gadgil has contributed to various companies, including Genus, Inc. His expertise in the field has led to significant advancements in semiconductor processing and coating technologies.

Collaborations

Prasad has collaborated with notable professionals in the industry, including Thomas E Seidel and Kenneth Brian Doering. Their combined efforts have furthered the development of innovative solutions in the field.

Conclusion

Prasad N Gadgil's contributions to the field of technology through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in semiconductor processing and coating technologies.