The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2004
Filed:
May. 20, 2002
Applicant:
Inventor:
Prasad Narhar Gadgil, Santa Clara, CA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ; H21L 2/131 ; C30B 2/500 ; C30B 2/812 ; C30B 2/814 ;
U.S. Cl.
CPC ...
C23C 1/600 ; H21L 2/131 ; C30B 2/500 ; C30B 2/812 ; C30B 2/814 ;
Abstract
An atomic layer deposition (ALD) reactor ( ) is disclosed that includes a substantially cylindrical chamber ( ) and a wafer substrate ( ) mounted within the chamber ( ). The ALD reactor ( ) further includes at least one injection tube ( ) mounted within the chamber ( ) having a plurality of apertures ( ) along one side that directs gas emanating from the apertures ( ) towards the wafer substrate ( ). While gas is pulsed from the injection tube ( ), either the water substrate ( ) or the injection tube ( ) is continuously rotated in a longitudinal plane within the chamber ( ) to ensure complete and uniform coverage of the wafer substrate ( ) by the gas.
Published as: