Hsinchu City, Taiwan

PO-Wen Chiu

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Tsinghua University, Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: PO-Wen Chiu. Retrieved from https://idiyas.com/inventor/po-wen-chiu-5c2a1wt3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

Average Co-Inventor Count = 2.0


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: PO-Wen Chiu’s Semiconductor Inventions

Introduction

PO-Wen Chiu is an inventor associated with Hsinchu City, Taiwan. His work includes semiconductor-device manufacturing and photoresist materials. He is credited with 2 patents.

Latest Patents

“Semiconductor Device and Manufacturing Method Thereof” describes a process for creating a van der Waals contact structure between a metal electrode and a semiconductor. The method deposits a protective layer on a two-dimensional semiconductor, patterns the layers, forms two electrodes, and then removes the protective layer to establish the contacts.

“Photoresist and Formation Method Thereof” concerns a photoresist composition containing a solvent and a specified photo-active compound. The method forms and patterns the photoresist over a material layer, then uses it as an etch mask to process the underlying material.

Career Highlights

Chiu’s listed affiliations include Tsinghua University and Taiwan Semiconductor Manufacturing Company Limited. These connections place his work within academic and industrial semiconductor research.

Collaborations

Chiu’s listed coworker is Yu-Lun Yang, a woman inventor. Their shared work reflects collaboration in semiconductor technologies.

Conclusion

PO-Wen Chiu’s two listed patents address semiconductor contacts and photoresist-based fabrication, highlighting his contributions to materials and manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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