This inventor holds 1 USPTO granted patent. Top assignees: National Tsing Hua University, Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 1,308 
1 out of 42,965 
Years Active: 2026
Title: The Innovations of PO-Hsiung Chen
Introduction
PO-Hsiung Chen is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor manufacturing. His work primarily focuses on photoresist technology and its applications in extreme ultraviolet lithography.
Latest Patents
PO-Hsiung Chen holds a patent for a method of manufacturing a semiconductor device. This patent involves forming a photoresist layer over a substrate, selectively exposing the photoresist layer to EUV radiation, and developing the selectively exposed photoresist layer. The photoresist layer comprises a composition that includes a solvent and a photo-active compound. This compound is a molecular cluster incorporating hexameric tin and two chloro ligands. He has 1 patent to his name.
Career Highlights
Throughout his career, PO-Hsiung Chen has worked with prominent organizations such as Taiwan Semiconductor Manufacturing Company Ltd. and Tsinghua University. His experience in these institutions has allowed him to advance his research and contribute to the semiconductor industry.
Collaborations
Some of his notable coworkers include Jui-Hsiung Liu and PO-Hsuan Lee. Their collaborative efforts have further enhanced the innovations in semiconductor technology.
Conclusion
PO-Hsiung Chen's contributions to semiconductor manufacturing and photoresist technology highlight his importance in the field. His innovative methods and collaborations continue to influence advancements in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile