Po-Hsiung Chen

Title: Po-Hsiung Chen: Innovator in Optical Aerial Imaging and Semiconductor Inspection

Introduction

Po-Hsiung Chen is an inventor based in Hsinchu City, Taiwan. He has made significant contributions to the fields of optical aerial imaging and semiconductor inspection. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.

Latest Patent Applications

One of Po-Hsiung Chen's notable patent applications is titled "METHOD OF CALCULATING OPTICAL AERIAL IMAGE." This method involves several steps, including multiplying a first pattern distribution in a spatial domain by a scaling constant to generate a second pattern distribution. A fast Fourier transform is then performed on this second pattern distribution to create a first spatial frequency spectrum distribution in a spatial frequency domain. Following this, the first spatial frequency spectrum distribution is multiplied by a pupil function to produce a second spatial frequency spectrum distribution. An inverse fast Fourier transform is applied to this second distribution to generate a first diffraction image distribution in the spatial domain, which is subsequently scaled to create a second diffraction image distribution.

Another significant application is for a "PHOTOLITHOGRAPH APPARATUS, METHOD FOR INSPECTING PARTICLES AND SEMICONDUCTOR PROCESS." This method is designed for inspecting particles on a substrate. It involves placing the substrate on a stage and providing inspection radiation to excite the particles, which then emit secondary radiation. This secondary radiation is detected to confirm the presence of particles and their positions on the substrate.

Conclusion

Po-Hsiung Chen's innovative approaches in optical imaging and semiconductor inspection demonstrate his potential impact on these fields. His latest patent applications reflect a commitment to advancing technology, even as he seeks to secure granted patents in the future.