Company Filing History:
Years Active: 2017
Title: Po-Hsieh Lin: Innovator in Semiconductor Technology
Introduction
Po-Hsieh Lin is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative devices and fabrication methods that enhance the performance and efficiency of semiconductor components.
Latest Patents
Among his latest patents, Po-Hsieh Lin has developed a semiconductor device and a fabrication method thereof. This semiconductor device comprises a semiconductor body, a first doped region, a second doped region, a gate, and a dielectric layer. The semiconductor body is situated on a dielectric substrate and features a protrusion portion, a first portion, and a second portion. The first and second portions are positioned on opposite sides of the protrusion portion. The first doped region is located at the top of the protrusion portion, while the second doped region is found at the end of the first portion, away from the protrusion. The gate is placed on the first portion, adjacent to the protrusion, with the dielectric layer positioned between the gate and both the protrusion and the first portion.
Additionally, he has patented a memory device that includes a substrate and a channel layer. The channel layer is designed in a T-shape, featuring a horizontal portion with a first and second end, along with a vertical portion that has a third end. A gate structure is positioned on the side of the vertical portion, with an oxide-nitride-oxide (ONO) layer situated between the gate structure and the vertical portion. The memory device also includes a source region on the first end of the horizontal portion and a drain region on the third end of the vertical portion.
Career Highlights
Po-Hsieh Lin is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to further develop his expertise and contribute to cutting-edge technologies in semiconductor fabrication.
Collaborations
Throughout his career, Po-Hsieh Lin has collaborated with notable colleagues, including Chia-Fu Hsu and Bei-Zhun Syu. These collaborations have fostered innovation and advancement in their respective fields.
Conclusion
Po-Hsieh Lin is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the industry. His patents reflect