Po-Chih Liu

Title: Po-Chih Liu: Innovator in Semiconductor Fabrication

Introduction

Po-Chih Liu is a notable inventor based in Taipei County, Taiwan. He has made significant contributions to the field of semiconductor fabrication, holding 2 patents that showcase his innovative approaches to technology.

Latest Patents

Liu's latest patents include methods for fabricating polysilicon film and thin film transistors. One of his patents discloses a method for fabricating polysilicon film, which begins with providing a first substrate that has a plurality of sunken patterns on its front surface. A second substrate is then introduced, on which an amorphous polysilicon film is formed. This film is brought into contact with the first substrate, and through an annealing process, the amorphous polysilicon film is transformed into a polysilicon film. The method ultimately reduces both the cost and time required for fabricating polysilicon film. Another patent details a process for fabricating a substrate that includes a semi-finished substrate, a circuit line, a contact, and a solder mask layer. The circuit line and contact are formed on the semi-finished substrate and are connected non-integrally, while the solder mask layer covers the circuit line with an opening for the contact.

Career Highlights

Throughout his career, Po-Chih Liu has worked with prominent companies in the semiconductor industry, including Advanced Semiconductor Engineering, Inc. and Chunghwa Picture Tubes, Ltd. His work has significantly impacted the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Liu has collaborated with notable colleagues such as YewChung Sermon Wu and Chih-Yuan Hou, contributing to advancements in their shared field of expertise.

Conclusion

Po-Chih Liu's innovative methods in semiconductor fabrication demonstrate his commitment to advancing technology. His contributions continue to influence the industry and pave the way for future developments.