Po-Cheng Lai

Title: Po-Cheng Lai: Innovator in Semiconductor Technology

Introduction

Po-Cheng Lai is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative methods for forming semiconductor devices and photomasks, which are crucial in the manufacturing of electronic components.

Latest Patents

One of Po-Cheng Lai's latest patents is titled "Method for forming semiconductor device." This patent describes a method that includes receiving a substrate with two openings of different widths, forming a protective layer, and performing wet etching to widen the smaller opening to match the width of the larger one. The process also involves photolithography to transfer the openings to a target layer.

Another significant patent is "Photomask and method for forming the same." This invention outlines a method for creating a photomask by removing exposed portions of a first layer on a substrate through a patterned second layer. The process includes wet etching to widen the openings created, enhancing the precision of the photomask.

Career Highlights

Po-Cheng Lai is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have contributed to advancements in semiconductor manufacturing processes.

Collaborations

Throughout his career, Po-Cheng Lai has collaborated with notable colleagues, including Chung-Yang Huang and Hao-Ming Chang. These collaborations have fostered a productive environment for innovation and development in semiconductor technologies.

Conclusion

Po-Cheng Lai's contributions to semiconductor technology through his patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key innovator in the field. His advancements continue to influence the industry and pave the way for future innovations.