Pingshan Luan

Title: The Innovative Contributions of Pingshan Luan

Introduction

Pingshan Luan is a notable inventor based in Albany, NY, with a significant portfolio of six patents. His work primarily focuses on advancements in semiconductor processing technologies, particularly involving silicon and silicon-germanium alloys.

Latest Patents

Luan's latest patents include a method for selective and isotropic etching of silicon over silicon-germanium alloys and dielectrics. This innovative approach provides selective protection and etching, which can be utilized in the etching of silicon-containing layers with respect to germanium or silicon-germanium layers. The process involves a treatment that modifies the surface of the layers, followed by a heat treatment to selectively sublimate portions of the silicon-containing layers. Additionally, he has developed a method for lateral etching of silicon, which includes positioning a substrate in a plasma processing chamber and utilizing a combination of process gases to achieve selective etching.

Career Highlights

Throughout his career, Pingshan Luan has worked with prominent companies in the semiconductor industry, including Tokyo Electron Limited. His expertise in plasma processing and etching techniques has contributed to advancements in the field, enhancing the efficiency and precision of semiconductor manufacturing.

Collaborations

Luan has collaborated with notable professionals in his field, including Aelan Mosden and Christopher Catano. These collaborations have further enriched his research and development efforts, leading to innovative solutions in semiconductor technology.

Conclusion

Pingshan Luan's contributions to the field of semiconductor processing through his patents and collaborations highlight his role as a significant innovator. His work continues to influence advancements in technology, showcasing the importance of innovation in the industry.