Ping-Wei Lin

Title: The Innovations of Ping-Wei Lin

Introduction

Ping-Wei Lin is a notable inventor based in Chia-I, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on methods that enhance the performance and reliability of insulating layers in electronic devices.

Latest Patents

Among his latest patents is a method to prevent the formation of a thinner portion of the insulating layer at the junction between the side walls and the bottom insulator. This innovative approach involves forming a pad oxide layer on the side walls and the bottom of the trench, followed by the creation of a bottom oxide on the lower portion of the trench. The process includes wet etching to leave a bottom oxide with a concave surface, allowing for the growth of a conformal gate oxide layer on the exposed side walls of the trench. Another significant patent is a method for forming a hemispherical-grain polysilicon. This method includes forming an alpha-silicon layer on a substrate, increasing the temperature of the UHV-CVD chamber, and intermittently conducting gas into the vacuum-chamber apparatus. This process enhances the throughput and reduces the process time for the polysilicon layer, ultimately increasing its electrical capacity.

Career Highlights

Ping-Wei Lin is currently employed at Mosel Vitelic Corporation, where he continues to innovate in the semiconductor industry. His expertise and contributions have positioned him as a key figure in his field.

Collaborations

He has collaborated with notable coworkers, including Ming-Kuan Kao and Jui-Ping Li, further enhancing the innovative environment at Mosel Vitelic Corporation.

Conclusion

Ping-Wei Lin's contributions to semiconductor technology through his patents and collaborative efforts highlight his importance as an inventor. His innovative methods continue to influence the industry and pave the way for future advancements.