Ping Qu

Title: Ping Qu - Innovator in Lithography and Optical Technologies

Introduction

Ping Qu is a notable inventor based in San Jose, California. He has made significant contributions to the fields of lithography and optical technologies. With a total of 2 patents, his work has advanced the capabilities of measurement tools and optical devices.

Latest Patents

One of his latest patents is a "Measurement tool and method for lithography masks." This invention focuses on a EUV mask measurement tool that includes a high power extreme ultraviolet (EUV) light beam, a detector assembly with projection optics, and a processor designed to determine the best focus plane for various test sites on a patterned mask. The method allows for continuous scanning to generate site-specific focus planes, enhancing the precision of lithography processes.

Another significant patent is the "Variable optical attenuator multiplexer with a thermal isolating optical joint." This invention features a multiplexer that incorporates thermal isolating optical joints and a combination of planar lightwave circuit components. The design aims to improve the thermal management of optical devices, ensuring better performance and reliability.

Career Highlights

Ping Qu is currently employed at Intel Corporation, where he continues to innovate and develop cutting-edge technologies. His work at Intel has positioned him as a key player in the advancement of optical and measurement technologies.

Collaborations

Throughout his career, Ping has collaborated with talented individuals such as William Wong and Tsung-Ein Tsai. These collaborations have contributed to the successful development of his patented technologies.

Conclusion

Ping Qu's contributions to the fields of lithography and optical technologies demonstrate his innovative spirit and technical expertise. His patents reflect a commitment to advancing measurement tools and optical devices, making a lasting impact in the industry.