Ping-Jung Huang

Title: The Innovative Contributions of Ping-Jung Huang

Introduction

Ping-Jung Huang is a notable inventor based in Douliou, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 11 patents. His work focuses on improving processes that enhance the efficiency and effectiveness of wafer processing.

Latest Patents

Among his latest patents, one is titled "Method for etching etch layer." This method involves rotating a wafer and dispensing a liquid from the center to the peripheral edge to control the wafer's temperature. The etching of the wafer's etch layer is performed with an etchant during or after the liquid dispensing process. The liquid is dispensed through a nozzle, showcasing an innovative approach to wafer processing. Another significant patent is "Wet bench process with in-situ pre-treatment operation." This patent describes a wet bench processing method that includes an in-situ pre-treatment before conducting the first set of wet bench operations. The pre-treatment may consist of a pre-clean operation and/or a pre-heat operation, which can be performed in existing ONB tanks without the need for additional tanks. This process aims to remove particles from a batch of wafers, thereby reducing cross-contamination and defect issues, ultimately improving the yield rate of the wet bench process.

Career Highlights

Ping-Jung Huang has worked with prominent companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Ltd. and the Industrial Technology Research Institute. His experience in these organizations has allowed him to develop and refine his innovative techniques in wafer processing.

Collaborations

Throughout his career, Huang has collaborated with esteemed colleagues such as Bi-Ming Yen and Jui-Ming Shih. These partnerships have contributed to the advancement of technology in the semiconductor field.

Conclusion

Ping-Jung Huang's contributions to semiconductor manufacturing through his innovative patents and collaborations highlight his importance in the industry. His work continues to influence the efficiency of wafer processing techniques, making a lasting impact on the field.