Ping Han Hsieh

Title: The Innovations of Ping Han Hsieh

Introduction

Ping Han Hsieh is a prominent inventor based in San Jose, CA, known for his significant contributions to the field of semiconductor technology. With a total of 9 patents to his name, Hsieh has made remarkable advancements in methods and apparatuses for epitaxial deposition and surface preparation.

Latest Patents

Among his latest patents, Hsieh has developed a cleaning method that focuses on the preparation of substrate surfaces prior to epitaxial deposition. This method involves etching the surface of a silicon-containing substrate using a plasma etch process, which incorporates at least one etching process gas, including chlorine gas and an inert gas. Additionally, he has worked on wafer-based corrosion and time-dependent chemical effects, which include a residual chemical reaction diagnostic device. This device features a substrate with a sensor that provides electrical outputs in response to residual chemical reactions, enhancing the reliability of semiconductor manufacturing processes.

Career Highlights

Hsieh is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work has been instrumental in advancing technologies that improve the efficiency and effectiveness of semiconductor fabrication.

Collaborations

Throughout his career, Hsieh has collaborated with notable colleagues, including Teng-fang Kuo and Peter Stone, contributing to various innovative projects and research initiatives.

Conclusion

Ping Han Hsieh's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in the industry, showcasing the importance of innovation in technology development.