Company Filing History:
Years Active: 1999-2001
Title: Innovations of Inventor Ping Chen
Introduction
Ping Chen is a notable inventor based in Round Rock, TX (US). He has made significant contributions to the field of semiconductor devices, holding a total of 2 patents. His work has been instrumental in advancing technology in this area.
Latest Patents
Ping Chen's latest patents include a process for forming a semiconductor device with thick and thin films. This patent describes a method where a first dielectric layer is formed over a semiconductor device substrate, followed by the patterning of a resist layer to expose portions of the first dielectric layer. Portions of the first dielectric layer are then removed to reveal parts of the semiconductor device substrate, after which the resist layer is removed. The semiconductor device substrate is cleaned without using a fluorine-containing solution, and a second dielectric layer is formed over the substrate.
Another significant patent by Ping Chen is a method for making a dual-thickness gate oxide layer. This method begins with the formation of a first oxide layer within active areas. A protection layer is then formed over this layer. A mask is used to allow the removal of the layers from the active area. A thermal oxidation process is subsequently employed to form a thin second oxide layer within the active area. Conductive gate electrodes are then formed, incorporating the first oxide layer and the protection layer into the gate dielectric layer of an MOS transistor.
Career Highlights
Ping Chen has had a distinguished career at Motorola Corporation, where he has contributed to various innovative projects. His expertise in semiconductor technology has made him a valuable asset to the company.
Collaborations
Throughout his career, Ping Chen has collaborated with notable colleagues, including Navakanta Bhat and Paul G Tsui. These collaborations have further enhanced his contributions to the field of semiconductor devices.
Conclusion
Ping Chen's work in semiconductor technology has led to significant advancements, as evidenced by his patents and collaborations. His contributions continue to influence the industry and pave the way for future innovations.