This inventor holds 8 USPTO granted patents and 5 published patent applications. Top assignee: Lam Research Corporation. Active years: 2016-2022.
Company Filing History:
Years Active: 2016-2022
Title: Pilyeon Park: Innovator in Substrate Processing Technologies
Introduction
Pilyeon Park is a notable inventor based in Santa Clara, CA, who has made significant contributions to the field of substrate processing technologies. With a total of 8 patents to his name, Park has demonstrated a strong commitment to innovation and advancement in his area of expertise.
Latest Patents
Among his latest patents is the "Ultrahigh selective nitride etch to form FinFET devices." This patent describes a substrate processing system designed for selectively etching a layer on a substrate. The system includes an upper chamber region, an inductive coil, and a lower chamber region with a substrate support. A gas distribution device is strategically placed between the two chamber regions, featuring a plate with multiple holes. The design ensures a surface to volume ratio of the holes that is greater than or equal to 4. The controller in this system selectively supplies an etch gas mixture and strikes plasma in the upper chamber to achieve precise etching.
Another significant patent is the "Plasma apparatus for high aspect ratio selective lateral etch using cyclic passivation and etching." This invention outlines methods and apparatus for laterally etching unwanted material from the sidewalls of a recessed feature. The process involves alternating between etching and depositing protective films until the unwanted material is completely removed. This innovative approach allows for targeted removal of material from specific depths along the sidewalls.
Career Highlights
Pilyeon Park is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has positioned him as a key player in the development of advanced substrate processing technologies.
Collaborations
Throughout his career, Park has collaborated with talented individuals such as Faisal Yaqoob and Ivan L Berry, III. These collaborations have likely contributed to the innovative solutions and patents that Park has developed.
Conclusion
Pilyeon Park's contributions to substrate processing technologies through his patents and work at Lam Research Corporation highlight his role as an influential inventor in the field. His innovative approaches continue to shape the future of semiconductor manufacturing.