This inventor holds 1 USPTO granted patent. Top assignee: Chartered Semiconductor Manufacturing Ltd (Corporation). Active years: 2000.
Company Filing History:
Years Active: 2000
Title: Phuan Yee Hwee: Innovator in Integrated Circuit Technology
Introduction
Phuan Yee Hwee is a notable inventor based in Singapore, recognized for his contributions to integrated circuit technology. He has developed innovative solutions that enhance the efficiency and accuracy of semiconductor manufacturing processes. His work has significant implications for the advancement of electronic devices.
Latest Patents
Phuan Yee Hwee holds a patent for "Printing optimized global alignment mark at contact/via layers." This invention involves the creation of scribeline alignment marks that serve as auxiliary alignment marks on an integrated circuit wafer. The scribeline alignment marks are designed to match the shape and size of contact holes formed in a dielectric layer. This design ensures that the alignment marks are not overexposed during the photolithographic process, which is optimized for contact holes. When filled with metal and planarized, the alignment marks facilitate automatic wafer positioning due to the step height created between the metal and the dielectric.
Career Highlights
Phuan Yee Hwee is currently employed at Chartered Semiconductor Manufacturing Ltd, a leading corporation in the semiconductor industry. His role involves leveraging his expertise to improve manufacturing processes and contribute to the development of cutting-edge technologies. His innovative approach has earned him recognition within the industry.
Collaborations
Phuan Yee Hwee has collaborated with several talented individuals, including Juan Boon Tan and Soon Ee Neoh. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of innovative solutions.
Conclusion
Phuan Yee Hwee's contributions to integrated circuit technology exemplify the impact of innovation in the semiconductor industry. His patent and collaborative efforts highlight the importance of continuous improvement in manufacturing processes. His work continues to influence the future of electronic device development.