Philippe Jansen

Title: Philippe Jansen: Innovator in Semiconductor Technology

Introduction

Philippe Jansen is a notable inventor based in Olen, Belgium. He has made significant contributions to the field of semiconductor technology, particularly in the area of etching processes for materials used in electronic devices. With a total of 2 patents, Jansen's work has advanced the manufacturing techniques for critical components in modern electronics.

Latest Patents

Jansen's latest patents focus on the etching process of CoSi2 layers. The inventions relate to methods for controlling the etching rate of CoSi2 layers by adjusting the pH of an HF-based solution. This adjustment allows for the desired etch rate to be achieved effectively. The pH of the HF-based solution can be modified by adding specific chemicals. Additionally, one of the patents describes an improved method for manufacturing Schottky barrier infrared detectors, which employs the controlled etching step. Another aspect of his work includes a method for reducing drain-induced barrier lowering in active transistors with small gate lengths.

Career Highlights

Throughout his career, Philippe Jansen has worked with prominent organizations in the semiconductor industry. He has been associated with Imec Vzw and the Interuniversitair Microelektronica Centrum (imec), where he has contributed to various research and development projects. His expertise in semiconductor technology has made him a valuable asset in these institutions.

Collaborations

Jansen has collaborated with several professionals in his field, including Ricardo Alves Donaton and Rita Verbeeck. These collaborations have further enriched his work and contributed to advancements in semiconductor technology.

Conclusion

Philippe Jansen's innovative work in etching processes and semiconductor technology has led to significant advancements in the field. His contributions continue to influence the development of electronic devices, showcasing the importance of innovation in technology.