Location History:
- Rowley, MA (US) (1978 - 1984)
- Gloucester, MA (US) (1989)
Company Filing History:
Years Active: 1978-1989
Title: Peter R. Hanley: Innovator in Semiconductor Processing
Introduction
Peter R. Hanley, an accomplished inventor based in Rowley, Massachusetts, has made significant contributions to the field of semiconductor processing. With a total of four patents to his name, Hanley's innovations focus on enhancing efficiency and performance in semiconductor manufacturing.
Latest Patents
One of Hanley's latest patents is a method for photoresist pretreatment prior to charged particle beam processing. This innovative technique involves bombarding a photoresist layer adhered to a semiconductor wafer with electrically inactive ions, particularly those of noble gases. This pretreatment method effectively reduces photoresist outgassing and carbonization during processing while maintaining the electrical properties of the wafer. Notably, it significantly minimizes dose measurement errors during ion implantation due to reduced outgassing. Furthermore, this method is performed at high current levels to enhance system throughput.
Another notable patent involves optimizing the surface contour for conductive heat transfer during ion implantation. In this invention, the semiconductor wafer is clamped to a platen configured to ensure uniform contact pressure across the wafer. This design maximizes the available area of the wafer, improving the overall efficiency of heat conductive transfer.
Career Highlights
Throughout his career, Peter R. Hanley has been associated with esteemed companies such as Varian Associates, Inc. and Radiation Dynamics, Inc. His work in these organizations has propelled advancements in semiconductor technologies and ensured the application of his innovative methodologies in various industrial processes.
Collaborations
Hanley has worked alongside talented individuals during his career, including coworkers Norman L. Turner and Scott C. Holden. These collaborations have provided a platform for sharing ideas and fostering innovation in the semiconductor field.
Conclusion
Peter R. Hanley's contributions to the realm of semiconductor processing have positioned him as a noteworthy inventor in his domain. His patented methods not only enhance the efficiency of semiconductor manufacturing but also address critical challenges in the industry. As he continues to push the boundaries of innovation, Hanley's work remains instrumental in shaping the future of semiconductor technologies.