Hillsboro, OR, United States of America

Peter P Sun

USPTO Granted Patents = 1 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Peter P Sun

Introduction

Peter P Sun is an accomplished inventor based in Hillsboro, OR (US). He is known for his contributions to the field of semiconductor technology, particularly in the design of integrated circuits. His innovative work has led to the development of techniques that enhance the performance and efficiency of semiconductor devices.

Latest Patents

Peter P Sun holds a patent for an invention titled "Angled gate or diffusion plugs." This patent describes techniques for forming an integrated circuit that includes gate cut structures or plug structures between source or drain regions. The invention features an angled cut made to the top portion of these structures, which improves the functionality of semiconductor devices. The patent outlines a semiconductor region that extends between source and drain regions, with a gate structure positioned over it. The gate cut structure interrupts the gate structure and has varying widths that optimize the design. This innovation also includes angled plug structures adjacent to the source and drain regions, which increase the landing area for metal contacts.

Career Highlights

Peter P Sun is currently employed at Intel Corporation, a leading technology company known for its advancements in semiconductor manufacturing. His work at Intel has allowed him to contribute significantly to the development of cutting-edge technologies in the industry.

Collaborations

Throughout his career, Peter has collaborated with notable colleagues, including Leonard P Guler and Tsuan-Chung Chang. These collaborations have further enriched his work and contributed to the success of various projects within the semiconductor field.

Conclusion

Peter P Sun's innovative contributions to semiconductor technology, particularly through his patent on angled gate structures, highlight his expertise and commitment to advancing the industry. His work at Intel Corporation and collaborations with esteemed colleagues underscore his significant impact on the field.

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