Peter D Roper

Title: Innovations by Peter D Roper

Introduction

Peter D Roper is a notable inventor based in Clinton Corners, NY (US). He has made significant contributions to the field of chemical-mechanical planarization, particularly in the semiconductor industry. With a total of 3 patents, Roper's work has had a profound impact on the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Roper's latest patents include innovative methods for improving chemical-mechanical polishing techniques. One of his patents focuses on the chemical-mechanical planarization of metallurgy, where copper or a copper alloy is removed using a slurry that contains an oxidizer, an oxidation inhibitor, and an additive that regulates copper complexing. Another significant patent addresses the elimination of photo-induced electrochemical dissolution in chemical mechanical polishing. This invention prevents the electrochemical dissolution of metal components on semiconductor devices by limiting exposure to light that could invoke a photovoltaic effect. Additionally, Roper's work includes the development of a darkened enclosure for tools used in wafer CMP, which helps to eliminate unwanted exposure to light.

Career Highlights

Peter D Roper is currently associated with International Business Machines Corporation (IBM), where he continues to innovate and contribute to advancements in semiconductor technology. His expertise in chemical-mechanical planarization has positioned him as a key figure in the industry.

Collaborations

Roper has collaborated with notable colleagues such as Daniel C Edelstein and Wilma Jean Horkans. These collaborations have further enhanced the development of his innovative patents and have contributed to the success of their projects.

Conclusion

Peter D Roper's contributions to the field of semiconductor manufacturing through his patents and collaborations highlight his importance as an inventor. His work continues to influence the industry and drive advancements in technology.