This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: The Innovative Contributions of Peter Andreas Maria Billekens
Introduction
Peter Andreas Maria Billekens is a notable inventor based in Meterik, Netherlands. He has made significant contributions to the field of technology, particularly in the development of tools for modifying substrate support elements. His innovative approach has led to advancements in lithographic apparatuses, which are essential in various manufacturing processes.
Latest Patents
Billekens holds a patent for a "Tool for modifying a support surface." This tool is designed to modify substrate support elements of a substrate holder. The substrate support elements feature support surfaces that are crucial for supporting a substrate. The tool includes a main body with a main body surface and multiple protrusions extending from this surface. These protrusions have distal ends that are specifically configured to contact the support surfaces, thereby modifying the substrate support elements. Additionally, the patent encompasses a lithographic apparatus and a method that incorporates such a tool.
Career Highlights
Billekens is currently employed at ASML Netherlands B.V., a leading company in the field of lithography equipment for the semiconductor industry. His work at ASML has positioned him at the forefront of technological innovation, contributing to the advancement of high-precision manufacturing techniques.
Collaborations
Throughout his career, Billekens has collaborated with talented individuals such as Bert Dirk Scholten and Tiannan Guan. These collaborations have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.
Conclusion
Peter Andreas Maria Billekens exemplifies the spirit of innovation through his contributions to the field of lithography and substrate support technology. His patent and work at ASML highlight his commitment to advancing technology and improving manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
