Petar Žuvela

Title: Petar Žuvela: Innovator in Optical Metrology

Introduction

Petar Žuvela is a notable inventor based in Singapore, recognized for his contributions to the field of optical metrology. With a focus on enhancing measurement techniques, he has developed innovative solutions that address complex challenges in optical measurements.

Latest Patents

Petar holds a patent titled "Mitigation of undesired spectral effects in optical metrology." This invention involves the optical measurement of a sample that includes a structure-of-interest (SOI) optically coupled to an unknown structure. The process extracts spectral variations correlated to key parameters associated with the SOI while removing irrelevant spectral variations from the unknown structure. An offline process generates a physics-based model from calibration measurements, and a machine learning model may also be created using the relevant spectral variations. In an in-line process, the sample is measured by filtering spectral signals to eliminate effects from the unknown structure, utilizing either the physics-based model or the trained machine learning model.

Career Highlights

Petar Žuvela is currently employed at Onto Innovation Inc., where he applies his expertise in optical metrology. His work focuses on developing advanced measurement techniques that improve the accuracy and reliability of optical measurements in various applications.

Collaborations

Throughout his career, Petar has collaborated with esteemed colleagues, including Jingsheng Shi and Wei Ming Chiew. These collaborations have contributed to the advancement of optical measurement technologies and have fostered innovation in the field.

Conclusion

Petar Žuvela's work in optical metrology exemplifies the impact of innovative thinking in scientific research and technology. His patent and contributions to Onto Innovation Inc. highlight his commitment to advancing measurement techniques in the optical domain.