Location History:
- Sunnyvale, CA (US) (2016)
- Fremont, CA (US) (2015 - 2018)
Company Filing History:
Years Active: 2015-2018
Title: The Innovations of Peng Xie
Introduction
Peng Xie is a notable inventor based in Fremont, CA, who has made significant contributions to the field of lithography. With a total of 9 patents to his name, he has focused on developing methods and apparatuses that enhance the precision of photolithography processes. His work is particularly relevant in the semiconductor industry, where the demand for high-quality manufacturing techniques is ever-increasing.
Latest Patents
One of Peng Xie's latest patents addresses the challenge of controlling photo acid diffusion in lithography processes. The patent outlines methods and apparatuses designed to minimize line edge and width roughness in lines formed by photolithography. The random diffusion of acid generated by a photoacid generator during lithography contributes to this roughness. The methods disclosed apply an electric field, a magnetic field, and/or a standing wave during photolithography processes. This innovative approach controls the diffusion of acids generated by the photoacid generator along the line and spacing direction, effectively preventing the line edge and width roughness that results from random diffusion. The patent also includes apparatuses for implementing these methods.
Career Highlights
Peng Xie has established himself as a key figure in the field of lithography through his work at Applied Materials, Inc. His expertise in photolithography has led to advancements that are crucial for the production of semiconductor devices. His contributions have not only improved manufacturing processes but have also set new standards in the industry.
Collaborations
Throughout his career, Peng has collaborated with several talented individuals, including Ludovic Godet and Christopher Dennis Bencher. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in lithography.
Conclusion
Peng Xie's work exemplifies the spirit of innovation in the field of lithography. His patents and contributions continue to influence the semiconductor industry, ensuring that manufacturing processes remain at the forefront of technology.