Taichung, Taiwan

Peng-Cheng Hong


Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2016-2025

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6 patents (USPTO):Explore Patents

Title: Innovations of Peng-Cheng Hong

Introduction

Peng-Cheng Hong is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology through his innovative sealing articles. With a total of 6 patents to his name, his work has had a considerable impact on the industry.

Latest Patents

One of his latest patents is titled "Sealing article comprising metal coating, method of making and method of using the same." This invention includes a sealing article that consists of a body and a coating layer on at least one surface of the body. The body is made from a polymeric elastomer, such as perfluoroelastomer or fluoroelastomer, while the coating layer comprises at least one metal. The sealing article can take various forms, including seals, gaskets, O-rings, and T-rings. It is designed to be resistant to ultra-violet (UV) light and plasma, making it suitable for sealing semiconductor processing chambers.

Career Highlights

Peng-Cheng Hong is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His work at this leading semiconductor manufacturer has allowed him to develop and refine his innovative sealing technologies. His contributions have been instrumental in enhancing the reliability and efficiency of semiconductor manufacturing processes.

Collaborations

Throughout his career, Peng-Cheng Hong has collaborated with talented individuals such as Hsueh-Kuang Ni and Chi-Jen Chen. These collaborations have fostered a creative environment that has led to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Peng-Cheng Hong's innovative work in sealing technologies has made a significant impact on the semiconductor industry. His patents reflect his commitment to advancing technology and improving manufacturing processes. His contributions will continue to influence the field for years to come.

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